- Claude Bernard -
“The joy of discovery is certainly the liveliest that the mind of man can ever feel”
PUBLICATIONS
A. Journal Publications
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S. Majee, C. Liu, B. Wu, S. –L. Zhang, Z. –B. Zhang: Ink-jet printed highly conductive and reliable pristine graphene patterns achieved with water-based ink and aqueous doping processing. Carbon 12/2016, 114:77-83. DOI: 10.1016/j.carbon.2016.12.003.
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F. Miao,, M.Song, J. Zhao, S.–L. Zhang, Z.-B. Zhang:Inkjet printing of electrochemically-exfoliated graphene nano-platelets. Synthetic Metals. 06/2016, DOI: 10.1016/j.synthmet.2016.06.029.
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Subimal Majee, M.Song, S.–L. Zhang, Z.-B. Zhang: Scalable inkjet printing of shear-exfoliated graphene transparent conductive films. Carbon 02/2016, 102:51-57. DOI: 10.1016/j.carbon.2016.02.013.
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Pedro Alpuim,, Maria Fátima Cerqueira, Denis Tondelier, Bernard Geffroy, Yvan Bonnassieux, Jean Eric Bourée: Effect of argon ion energy on the performance of silicon nitride multilayer permeation barriers grown by hot-wire CVD on polymers. Thin Solid Films. 11/2015; 595:258-265. DOI: 10.1016/j.tsf.2015.09.048
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Subimal Majee, Maria Fátima Cerqueira, Denis Tondelier, Bernard Geffroy, Yvan Bonnassieux, Pedro Alpuim, Jean Eric Bourée: Flexible organic–inorganic hybrid layer encapsulation for organic opto-electronic devices. Progress in Organic Coatings 03/2015; 80:27-32. DOI:10.1016/j.porgcoat.2014.11.015
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S. Majee, M. F. Cerqueira, D. Tondelier, J. C. Vanel, B. Geffroy, Y. Bonnassieux, P. Alpuim, J. E. Bourée: Permeation barrier performance of Hot Wire-CVD grown silicon-nitride films treated by argon plasma. Thin Solid Films 10/2014; 575: 72-75. DOI:10.1016/j.tsf.2014.10.009
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Subimal Majee, Bernard Geffroy, Yvan Bonnassieux, Jean-Eric Bourée: Interface effects on the moisture barrier properties of SiNx/PMMA/SiNx hybrid structure. Surface and Coatings Technology 09/2014; 254:429-432. DOI:10.1016/j.surfcoat.2014.06.059
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X. Li, O. E. Tereshchenko, , G. Lampel, Y. Lassailly, D. Paget, J. Peretti:Optical detection of spin-filter effect for electron spin polarimetry. Applied Physics Letters. 08/2014; 105(5):052402. DOI:10.1063/1.4892073
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Subimal Majee, Maria Fátima Cerqueira, Denis Tondelier, Bernard Geffroy, Yvan Bonnassieux, Pedro Alpuim, Jean Eric Bourée: Influence of low energy argon plasma treatment on the moisture barrier performance of hot wire-CVD grown SiNx multilayers. Japanese Journal of Applied Physics 04/2014; 53(5S1):05FM05. DOI:10.7567/JJAP.53.05FM05
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S. Majee, M. F. Cerqueira, D. Tondelier, B. Geffroy, Y. Bonnassieux, P. Alpuim, J. E. Bouree: The effect of argon plasma treatment on the permeation barrier properties of silicon nitride layers. Surface and Coatings Technology 11/2013; 235:361-366. DOI:10.1016/j.surfcoat.2013.07.067
B. Conference Papers
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Subimal Majee, M.Song, S.–L. Zhang, Z.-B. Zhang: Production of transparent and conductive stable graphene ink for inkjet printing method. EMRS Fall Meeting 2015, Warsaw, Poland; 09/2015
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Subimal Majee, M. Song, Z. –B. Zhang: Printable graphene ink produced by liquid-phase shear exfoliation of graphite. European Graphene Forum, Stockholm, Sweden; 08/2015
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Subimal Majee, P.Alpuim, M.F. Cerqueira, B. Geffroy, Y. Bonnassieux, J.E. Bourée: Effect of argon ion energy on the quality of Hot-Wire CVD grown silicon-nitride permeation barriers. HWCVD8, Braunschweig, Germany; 10/2014
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Subimal Majee, M.F. Cerqueira, D. Tondelier, B. Geffroy, Y. Bonnassieux, P. Alpuim, J.E. Bourée: Permeation barrier performance of inorganic / organic / inorganic hybrid structure for organic photovoltaic devices. Matériaux et Nanostructures π-Conjugués, Annecy, France; 10/2013
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Subimal Majee, M.F. Cerqueira, D. Tondelier, B. Geffroy, Y. Bonnassieux, P. Alpuim, J.E. Bourée: Effect of Argon Plasma Treatment on Silicon Nitride Barrier films for OPV cells. MRS-JSAP Joint Symposium, Kyoto, Japan; 09/2013
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Subimal Majee, M.F. Cerqueira, D. Tondelier, B. Geffroy, Y. Bonnassieux, P. Alpuim, J.E. Bourée: The Effect of Argon Plasma Treatment on the Performance of Silicon Nitride Permeation Barrier Multilayers for Organic Photovoltaics. E-MRS Spring meeting 2013, Strasburg, France; 05/2013
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Subimal Majee, M.F. Cerqueira, D. Tondelier, B. Geffroy, Y. Bonnassieux, P. Alpuim, J.E. Bourée: Effect of Low Energy Ar Plasma Treatment on the Morphology of Hot-Wire CVD Grown SiNx Interface and on the Permeation Barrier of Stacked SiNx Single-layers. JNPV2013 conference, Dourdan, France; 12/2012
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Subimal Majee, M.F. Cerqueira, D. Tondelier, B. Geffroy, Y. Bonnassieux, P. Alpuim, J.E. Bourée: Multilayers of Silicon nitride thin films as an encapsulation barrier for flexible organic electronic devices. DIELOR conference, Limoges, France; 11/2012
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Subimal Majee, M.F. Cerqueira, D. Tondelier, B. Geffroy, Y. Bonnassieux, P. Alpuim, J.E. Bourée: Effect of argon plasma surface treatment on the permeation barrier performance of silicon-nitride thin films. HWCVD7, Osaka, Japan; 10/2012
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Subimal Majee, M.F. Cerqueira, D. Tondelier, B. Geffroy, Y. Bonnassieux, P. Alpuim, J.E. Bourée: Silicon nitride multilayers as permeation barrier for OLEDs. Effect of Argon plasma treatment. E-MRS Spring meeting 2012, Strasburg, France; 05/2012
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Subimal Majee, M.F. Cerqueira, D. Tondelier, B. Geffroy, Y. Bonnassieux, P. Alpuim, J.E. Bourée: Encapsulation for organic devices deposited on polymer substrates. IONS conference, Paris, France; 02/2012
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S. Bhattacharyya, A. Mandal, S. Majee, S. Ghosal: Popularity of Raman Amplifier in Optical Fiber Technology. Physics & Technology of All-Optical Communications and Devices, Department of Physics & Meteorology, Indian Institute of Technology, Kharagpur, India, 11/2007.
C. Schools and workshops
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2nd International Workshop on TEM Spectroscopy 2015, Uppsala, Sweden, 05/2015.
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S.Majee: Encapsulation for flexible organic electronics: Protection from environment. International Displays Research Workshop 2014 (10th French-Korean Joint Workshop), Palaiseau, France, 01/2014
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S. Majee: Silicon Nitride multilayers as a permeation barrier for PET based organic devices. JAIST International School on Cat-CVD, Kanazawa, Japan, 03/2013.
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S. Majee, D. Banerjee, S. N. Singh: Fabrication of crystalline silicon solar cells with optical confinement using texture and anti-reflection coating and their characterization. New Generation Electronics workshop, Kolkata, India, 03/2008.